Abstract In this work, micro/nano size pits were introduced to the surface of Fe80B20 amorphous ribbons by electrochemical etching treatment. The results show that the size of the pits is more sensitive to the applied etching potential, while the pit homogeneity is time dependent. The etching treatment at −0.30 V (vs saturated calomel electrode) for three hours in 1 M HCl solution saturated by KCl leads to the formation of numerous pits with an average diameter of 222 nm. The large amount of pits results in higher degradation efficiency on Direct Blue 15 when compared with the as-spun amorphous alloy.

中文翻译：

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Fe 80 B 20 非晶合金上高催化活性微/纳米凹坑的形成

摘要 在这项工作中，通过电化学蚀刻处理在 Fe80B20 非晶带表面引入微/纳米尺寸的凹坑。结果表明，凹坑的大小对施加的蚀刻电位更敏感，而凹坑的均匀性与时间有关。在-0.30 V（相对于饱和甘汞电极）下在被 KCl 饱和的 1 M HCl 溶液中蚀刻处理三小时导致形成许多平均直径为 222 nm 的凹坑。与初纺非晶合金相比，大量的凹坑导致 Direct Blue 15 的降解效率更高。