H₂-rich gas production from CH₄ at mild temperature (673 K), was achieved in a single step without introducing a separate oxygen stream. This was conducted in a plasma-assisted packed bed reactor in the presence of Ni-based catalysts doped on an active support, i.e. Fe₂O₃. Among the tested materials, NiO/Fe₂O₃ was found to be very promising and its excellent catalytic properties seemed to be induced by the presence of Fe₂O₃, which suppressed the formation of deposited carbon, and thus maintained the catalytic effect of metallic Ni (formed during NiO reduction by the CH₄/Ar plasma). This work demonstrates the potential of plasma-assisted chemical looping partial oxidation for H₂ production.

在不引入单独的氧气流的情况下，仅需一步即可在温和的温度（673 K）下从CH ₄生产富含H _2的气体。这是在等离子体辅助填充床反应器中，在掺杂有活性载体（即Fe ₂ O _3）的镍基催化剂的存在下进行的。在测试的材料中，发现NiO / Fe ₂ O ₃非常有前途，并且似乎由Fe ₂ O ₃的存在诱导了其优异的催化性能，从而抑制了沉积碳的形成，从而保持了NiO / Fe ₂ O ₃的催化作用。金属镍（由CH ₄还原NiO时形成/ Ar等离子）。这项工作证明了等离子体辅助化学循环部分氧化在生产H _2方面的潜力。