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Viscosity of As 20 Se 80 amorphous chalcogenide films
Materials Letters ( IF 2.7 ) Pub Date : 2018-10-01 , DOI: 10.1016/j.matlet.2018.06.065
S. Molnar , R. Bohdan , V. Takats , Yu. Kaganovskii , S. Kokenyesi

Abstract The knowledge of viscosity, which determines the flow of material under applied stresses, is important for many processes of the material production. Data on viscosity of thin amorphous films are necessary for development of molding technology, which allows fast fabrication of various components for integrated optics. Chalcogenide films attract great attention due to their non-linear optical properties and possibility of viscosity variation by light illumination. Despite of importance of data on the film viscosity, no methods of their direct measurements were reported. We propose such method and apply it for measurements of viscosity of As 20 Se 80 chalcogenide films in a temperature range 378–403 K. We have obtained that coefficients of viscosity vary in the range 3 × 10 7 –10 10 Pa·s, with the activation energy 2.9 eV. The thin film viscosity coefficients are 2–5 times smaller compared to those for massive glasses.

中文翻译:

As 20 Se 80 非晶硫族化物薄膜的粘度

摘要 粘度知识决定了材料在施加应力下的流动,对于材料生产的许多过程都很重要。非晶薄膜的粘度数据对于成型技术的发展是必要的,它允许快速制造用于集成光学的各种组件。硫属化物薄膜因其非线性光学特性和光照射下粘度变化的可能性而备受关注。尽管关于薄膜粘度的数据很重要,但没有报道它们的直接测量方法。我们提出了这种方法并将其应用于 378-403 K 温度范围内 As 20 Se 80 硫族化物薄膜的粘度测量。我们已经获得粘度系数在 3 × 10 7 –10 10 Pa·s 范围内变化,其中活化能 2.9 eV。
更新日期:2018-10-01
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