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Superlubricity of epitaxial monolayer WS2 on graphene
Nano Research ( IF 9.5 ) Pub Date : 2018-06-18 , DOI: 10.1007/s12274-018-2108-7
Holger Büch , Antonio Rossi , Stiven Forti , Domenica Convertino , Valentina Tozzini , Camilla Coletti

We report the superlubric sliding of monolayer tungsten disulfide (WS2) on epitaxial graphene (EG) grown on silicon carbide (SiC). Single-crystalline WS2 flakes with lateral size of hundreds of nanometers are obtained via chemical vapor deposition (CVD) on EG. Microscopic and diffraction analyses indicate that the WS2/EG stack is predominantly aligned with zero azimuthal rotation. The present experiments show that, when perturbed by a scanning probe microscopy (SPM) tip, the WS2 flakes are prone to slide over the graphene surfaces at room temperature. Atomistic force field-based molecular dynamics simulations indicate that, through local physical deformation of the WS2 flake, the scanning tip releases enough energy to the flake to overcome the motion activation barrier and trigger an ultralow-friction rototranslational displacement, that is superlubric. Experimental observations show that, after sliding, the WS2 flakes come to rest with a rotation of nπ/3 with respect to graphene. Moreover, atomically resolved measurements show that the interface is atomically sharp and the WS2 lattice is strain-free. These results help to shed light on nanotribological phenomena in van der Waals (vdW) heterostacks, and suggest that the applicative potential of the WS2/graphene heterostructure can be extended by novel mechanical prospects.

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中文翻译:

外延单层WS的超润滑性2个 在石墨烯上

我们报告了在碳化硅(SiC)上生长的外延石墨烯(EG)上单层二硫化钨(WS 2)的超润滑滑动。通过在EG上的化学气相沉积(CVD)获得横向尺寸为数百纳米的单晶WS 2薄片。显微镜和衍射分析表明,WS 2 / EG堆栈主要与零方位角旋转对齐。本实验表明,当受到扫描探针显微镜(SPM)尖端的干扰时,WS 2薄片在室温下易于在石墨烯表面上滑动。基于原子力场的分子动力学模拟表明,通过WS 2的局部物理变形薄片时,扫描尖端会向薄片释放足够的能量,从而克服运动激活障碍并触发超低摩擦的旋转位移,即超级润滑。实验观察表明,滑动之后,WS 2薄片配备的旋转休息Ñ π/ 3相对于石墨烯。此外,原子分辨的测量结果表明界面原子上很清晰,并且WS 2晶格没有应变。这些结果有助于阐明范德华(vdW)异质堆栈中的纳米摩擦学现象,并表明WS 2 /石墨烯异质结构的应用潜力可以通过新颖的机械前景来扩展。

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更新日期:2018-06-18
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