The large-area and scalable patterning process of conjugated polymers is a critical step toward their practical applications in organic electronics. Here we report a wafer-scale patterning method for 2D conjugated microporous polymer (CMP) films on arbitrary substrates via photomask-assisted solid-state photopolymerization under ambient conditions. 2D CMP patterns from monomeric carbazole materials were controllably prepared with variable geometries with the geometric photomasks and desired film thicknesses by modulating the polymerization time. Moreover, 2D CMP patterns with various size and shapes can be formed onto a reduced graphene oxide (rGO) substrate to construct 2D CMP/rGO heterostructures. The obtained heterostructure exhibited a p-type behavior compared to the metal-like property of the rGO film. Combining this solid-state photopolymerization with photomask techniques, a patterned 2D organic/inorganic heterostructure with a precise size and shape control could be further realized for other 2D materials and their integrated devices.

中文翻译：

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通过光掩模辅助固态光聚合进行 大面积图案化的二维共轭微孔聚合物†

共轭聚合物的大面积可扩展构图工艺是其在有机电子学中实际应用的关键一步。在这里，我们报告了一种通过任意基板上的2D共轭微孔聚合物（CMP）膜的晶圆规模构图方法，该方法通过在环境条件下进行光掩模辅助的固态光聚合。通过调节聚合时间，可控制地制备具有可变几何形状，具有几何光掩模和所需膜厚的单体咔唑材料的2D CMP图案。而且，可以在还原的氧化石墨烯（rGO）衬底上形成具有各种尺寸和形状的2D CMP图案，以构造2D CMP / rGO异质结构。与rGO膜的金属样性质相比，获得的异质结构表现出p型行为。将该固态光聚合与光掩模技术相结合，可以进一步实现其他2D材料及其集成设备具有精确尺寸和形状控制的图案化2D有机/无机异质结构。