Abstract The Ti and Ni alternating layers were deposited onto the base materials by magnetron sputtering. Ti/Ni multilayers with different stoichiometries of Ti and Ni were investigated. The joining processes were performed at 800 °C for 60 min under pressure of 5–15 MPa. The microstructures of the interface and the mechanical performances were assessed. Reliable joints can be obtained successfully with all three multilayers with different Ti/Ni ratios. A higher pressure and higher Ni content in the multilayers contributed to a higher shear strength. The highest shear strength of 160 MPa was achieved for the joint under 15 MPa using Ti/Ni multilayers with the stoichiometry ratio of Ti/Ni of 1:3, the hardness of the joint was 6.9 GPa. The intermediate phases appeared to be combinations of hard intermetallics frequently occurred in the Ti-Ni binary system.

中文翻译：

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Ti6Al4V 合金与 Ti/Ni 纳米结构多层膜的反应辅助扩散键合

摘要 通过磁控溅射在基材上沉积Ti和Ni交替层。研究了具有不同化学计量的 Ti 和 Ni 的 Ti/Ni 多层膜。连接过程在 800°C 下进行 60 分钟，压力为 5-15 兆帕。评估了界面的微观结构和机械性能。使用具有不同 Ti/Ni 比率的所有三个多层可以成功获得可靠的接头。多层中更高的压力和更高的镍含量有助于更高的剪切强度。使用 Ti/Ni 化学计量比为 1:3 的 Ti/Ni 多层膜，接头在 15 MPa 下的最高剪切强度达到 160 MPa，接头硬度为 6.9 GPa。