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Double-Layer Morphologies from a Silicon-Containing ABA Triblock Copolymer
ACS Nano ( IF 15.8 ) Pub Date : 2018-06-01 00:00:00 , DOI: 10.1021/acsnano.8b02851
Sangho Lee 1 , Li-Chen Cheng 1 , Karim R. Gadelrab 1 , Konstantinos Ntetsikas 2 , Dimitrios Moschovas 2 , Kevin G. Yager 3 , Apostolos Avgeropoulos 2 , Alfredo Alexander-Katz 1 , Caroline A. Ross 1
Affiliation  

A combined experimental and self-consistent-field theoretical (SCFT) investigation of the phase behavior of poly(stryrene-b-dimethylsiloxane-b-styrene) (PS-b-PDMS-b-PS, or SDS32) thin films during solvent vapor annealing is presented. The morphology of the triblock copolymer is described as a function of the as-cast film thickness and the ratio of two different solvent vapors, toluene and heptane. SDS32 formed terraced bilayer morphologies even when the film thickness was much lower than the commensurate thickness. The morphology transitioned between bilayer cylinders, bilayer perforated lamellae, and bilayer lamellae, including mixed structures such as a perforated lamella on top of a layer of in-plane cylinders, as the heptane fraction during solvent annealing increased. SCFT modeling showed the same morphological trends as a function of the block volume fraction. In comparison with diblock PS-b-PDMS with the same molecular weight, the SDS32 offers a simple route to produce a diversity of well-ordered bilayer structures with smaller feature sizes, including the formation of bilayer perforated lamellae over a large process window.

中文翻译:

含硅的ABA Triblock共聚物的双层形态

一种组合的实验和自洽场聚的相行为的理论(SCFT)调查(stryrene- b -dimethylsiloxane- b -苯乙烯)(PS- b -PDMS- b介绍了溶剂蒸汽退火过程中的-PS或SDS32)薄膜。三嵌段共聚物的形貌被描述为铸态膜厚度和两种不同溶剂蒸气(甲苯和庚烷)之比的函数。即使膜厚度远小于相应的厚度,SDS32仍会形成梯形的双层形态。随着溶剂退火过程中庚烷分数的增加,形态在双层圆柱体,双层穿孔薄片和双层薄片之间转变,包括混合结构,例如在平面圆柱体层顶部的穿孔薄片。SCFT建模显示出与块体积分数有关的相同形态趋势。与diblock PS- b相比-具有相同分子量的PDMS,SDS32提供了一种简单的方法来生产具有较小特征尺寸的各种有序双层结构,包括在较大的工艺窗口上形成双层穿孔薄片。
更新日期:2018-06-01
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