UV photochemical vapor generation–nitrogen microwave induced plasma optical emission spectrometric determination of nickel,Journal of Analytical Atomic Spectrometry

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UV photochemical vapor generation–nitrogen microwave induced plasma optical emission spectrometric determination of nickel
Journal of Analytical Atomic Spectrometry ( IF 3.1 ) Pub Date : 2018-05-10 00:00:00 , DOI: 10.1039/c8ja00100f
Mengtian Li _{1,

2,

3,

4} , Yujia Deng _{2,

3,

4,

5} , Xiaoming Jiang _{2,

3,

4,

5} , Xiandeng Hou _{1,

2,

3,

4,

5}

Affiliation

Photochemical vapor generation (PVG) was utilized for gaseous sample introduction into a nitrogen microwave induced plasma optical emission spectrometer (MIP-OES). The MIP-OES system can provide low-cost analysis due to the use of nitrogen, but the relatively low temperature of the nitrogen microwave plasma makes it susceptible to sample matrix effects. PVG could convert an analyte into a volatile species and effectively separate it from the sample matrix to realize gaseous sample introduction with high transport efficiency. The proposed PVG-MIP-OES was successfully applied for the determination of trace amounts of nickel. Volatile Ni(CO)₄ could be generated when a standard or sample in formic acid solution was exposed to UV irradiation in a photochemical reactor, and it could be subsequently transported to the nitrogen MIP-OES for excitation and detection. Under optimized experimental conditions, a limit of detection (LOD) of 0.3 μg L⁻¹ was obtained with a relative standard deviation (RSD) of 4.8% (100 μg L⁻¹, n = 11), with an 83-fold sensitivity enhancement compared to solution pneumatic nebulization for sample introduction. The method validation was demonstrated by successful analysis of nickel-containing water Certified Reference Material (CRM) and multi-walled carbon nanotubes.

中文翻译：

紫外光化学蒸气发生-氮气微波诱导等离子体发射光谱法测定镍

光化学蒸气产生（PVG）用于将气态样品引入氮气微波感应等离子体发射光谱仪（MIP-OES）中。由于使用了氮气，MIP-OES系统可以提供低成本的分析，但是氮气微波等离子体的温度相对较低，因此很容易受到样品基质的影响。PVG可以将分析物转化为挥发性物质，并有效地将其与样品基质分离，从而以高运输效率实现气态样品的引入。所提出的PVG-MIP-OES已成功地用于测定痕量镍。挥发性Ni（CO）₄当甲酸溶液中的标准品或样品在光化学反应器中暴露于紫外线辐射时，会生成汞，然后可以将其运输到氮气MIP-OES中进行激发和检测。在优化的实验条件下，检出限（LOD）为0.3μgL ^-1，相对标准偏差（RSD）为4.8％（100μgL ^-1，n = 11），灵敏度提高了83倍与用于溶液引入的溶液气动雾化相比。通过对含镍水认证参考材料（CRM）和多壁碳纳米管的成功分析证明了该方法的有效性。

更新日期：2018-05-10

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