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Formation process and mechanism of iron-nitride compounds on Si(111)-7×7-CH3OH surface
Chemical Physics Letters ( IF 2.8 ) Pub Date : 2018-05-08 , DOI: 10.1016/j.cplett.2018.05.011
Wenxin Li , Wanyu Ding , Dongying Ju , Ken-ichi Tanaka , Fumio Komori

Fe atoms were deposited on Si(111)-7×7 restructured surface, which had been covered by CH3OH molecules. A newly formed surface is stabilized by a quasi-potential made by breaking, and adsorbed atoms or molecules can be stabilized by forming “quasi-compounds”. Then, aim to greatly enhance the magnetic properties of the memory units, nitriding experiments were implemented on the existing Fe compounds. With the in-situ observation of STM, a series of Fe3N structures make up the newly emerged iron-nitride compounds, showing good linear characteristics. By adjusting the concentration, this study further explored its formation process and compounds models.



中文翻译:

Si(111)-7×7-CH 3 OH表面上氮化铁化合物的形成过程和机理

Fe原子沉积在已被CH 3 OH分子覆盖的Si(111)-7×7重组表面上。新形成的表面通过断裂产生的准电势而稳定,并且吸附的原子或分子可以通过形成“准化合物”而稳定。然后,为了大大提高存储单元的磁性能,对现有的铁化合物进行了氮化实验。通过STM的现场观察,一系列Fe 3 N结构组成了新出现的氮化铁化合物,具有良好的线性特征。通过调节浓度,本研究进一步探索了其形成过程和化合物模型。

更新日期:2018-05-09
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