当前位置: X-MOL 学术Electrochem. Commun. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Hybrid rinse solvent processing highly flat perovskite films on planar substrate
Electrochemistry Communications ( IF 4.7 ) Pub Date : 2018-05-07 , DOI: 10.1016/j.elecom.2018.05.009
Fanli Meng , Xinding Lv , Jiaojiao Wu , Yan-Zhen Zheng , Guozhong Cao , Xia Tao

A hybrid rinse solvent (n-hexane mixed with chlorobenzene) is developed for reproducibly preparing highly flat perovskite films on planar substrates via solvent engineering process. The hybrid rinse solvent induces to form a well-defined intermediate phase, and hence assists the formation of highly flat and dense perovskite surface. Morphological, spectroscopic, and electrochemical characterizations show that the highly flat surface of perovskite film allows tight contact and facile interfacial charge transfer at ZnO/CH3NH3PbI3/spiro-OMeTAD interfaces.



中文翻译:

混合冲洗溶剂可在平面基材上处理高度平坦的钙钛矿薄膜

开发了一种混合漂洗溶剂(正己烷与氯苯混合),用于通过溶剂工程工艺可重复地在平面基材上制备高度平整的钙钛矿薄膜。混合漂洗溶剂可诱导形成明确的中间相,因此有助于形成高度平坦且致密的钙钛矿表面。形态,光谱学,和电化学表征表明,钙钛矿薄膜的高度平坦的表面允许紧密接触,并在氧化锌/ CH容易界面电荷转移3 NH 3碘化铅3 /螺环-OMeTAD接口。

更新日期:2018-05-07
down
wechat
bug