Passive films were grown at constant potential in acidic (pH 2) and alkaline (pH 13) solutions on chromium, AISI 304L, AISI 316L and Duplex stainless steels. Passive films on chromium grow following a high field mechanism considering the presence of dissolution phenomena. According to the photoelectrochemical characterization, passive films on Cr have a bandgap of 3.4 eV when formed in acidic solution, and of 2.4 eV when formed in alkaline solution due to the formation of Cr(OH)₃. These films result to be poorly stable against anodic dissolution due to a very anodic flat band potential. Conversely, impedance and photoelectrochemical measurements proved that passive films on stainless steels are chromium rich oxide n-type semiconductors with a very high polarization resistance. Their band gap depends on the pH of the passivation solution and the SS composition.

钝化膜在铬（AISI 304L，AISI 316L和Duplex不锈钢）的酸性（pH 2）和碱性（pH 13）溶液中以恒定电位生长。考虑到溶解现象的存在，铬上的钝化膜按照高磁场机理生长。根据光电化学特征，由于形成了Cr（OH）₃，Cr上的钝化膜在酸性溶液中形成的带隙为3.4 eV，在碱性溶液中形成的带隙为2.4 eV。。这些膜由于非常平坦的阳极带电势而导致对阳极溶解的稳定性差。相反，阻抗和光电化学测量证明，不锈钢上的钝化膜是具有非常高的极化电阻的富铬氧化物n型半导体。它们的带隙取决于钝化溶液的pH和SS组成。