Abstract Herein, we report the study of the electrodeposition of copper oxides mainly Cuprite (Cu2O), paramelaconite Cu4O3 and tenorite (CuO) from a slightly acidic Cu(II) acetate solution on indium-doped tin oxide (ITO) substrate. A formation mechanism was proposed based on the observation of a series of reaction intermediates. The potential domain where the electrodeposition of copper oxides (CuxOy) is possible was investigated. The nucleation mechanism of (Cu2O) during electrodeposition was studied as a function of Cu2+ concentrations and deposition potential by exploiting the electrochemical techniques such as cyclic voltammetry and chronoamperometry. This study enabled us to demonstrate that the nucleation process and the growth of dendrites obey the model of Scharifker and Hills 3D instantaneous under diffusion control. Morphological and structural characterizations of the electrodeposit are performed by scanning electron microscopy (SEM) and X-ray diffraction (XRD).

中文翻译：

---

从醋酸盐浴中电沉积氧化铜 (Cu x O y )

摘要 在此，我们报告了从微酸性醋酸铜 (II) 溶液中在掺铟氧化锡 (ITO) 基板上电沉积铜氧化物的研究，主要是赤铜矿 (Cu2O)、副黑铜矿 Cu4O3 和 Tenorite (CuO)。基于对一系列反应中间体的观察，提出了形成机制。研究了可能电沉积氧化铜 (CuxOy) 的电位域。通过利用循环伏安法和计时电流法等电化学技术，研究了电沉积过程中 (Cu2O) 的成核机制作为 Cu2+ 浓度和沉积电位的函数。这项研究使我们能够证明成核过程和枝晶的生长遵循扩散控制下的 Scharifker 和 Hills 3D 瞬时模型。