Abstract Cu2ZnSnS4 (CZTS) is highly researched photovoltaic (PV) material in recent years because of resource availability and non-toxicity of its constituents. Radio frequency (RF) magnetron sputtering is one of the potential methods of fabricating CZTS thin film due to its suitability for large scale industrial implementation. Of the three methods of depositing CZTS films by RF sputtering, one step single quaternary target sputtering is by far the simplest and straightforward one. However, deposition profile plays a crucial role in maintaining the integrity of pre-defined target composition transferred to glass substrates. In this study, several deposition parameters, such as RF power, working pressure, and target to sample distance were varied and their influences on corresponding compositional variation in deposited samples were studied. A quaternary CZTS target with pre-fixed composition (Cu = 22%, Zn = 15%, Sn = 13%, S = 50%) was used to deposit CZTS thin films at various depositing conditions. Among all deposition profiles, high RF power was found to be more detrimental with high Cu loss up to 53% from the original atomic composition.

中文翻译：

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通过射频溅射从单一四元化合物靶材沉积的 Cu 2 ZnSnS 4 (CZTS) 薄膜的成分差异

摘要 Cu2ZnSnS4（CZTS）是近年来备受关注的光伏（PV）材料，因为其成分的资源可用性和无毒。射频 (RF) 磁控溅射是制造 CZTS 薄膜的潜在方法之一，因为它适用于大规模工业实施。在通过射频溅射沉积 CZTS 薄膜的三种方法中，一步单四元靶溅射是迄今为止最简单直接的一种。然而，沉积轮廓在保持转移到玻璃基板的预定义目标组合物的完整性方面起着至关重要的作用。在这项研究中，改变了几个沉积参数，例如射频功率、工作压力和目标与样品的距离，并研究了它们对沉积样品中相应成分变化的影响。具有预先固定成分（Cu = 22%，Zn = 15%，Sn = 13%，S = 50%）的四元 CZTS 靶用于在各种沉积条件下沉积 CZTS 薄膜。在所有沉积分布中，发现高 RF 功率更有害，Cu 损失高达原始原子组成的 53%。