Compared to tungsten (W), tantalum (Ta) has shown superior resistance to helium (He)-induced surface morphology changes under fusion-relevant irradiation conditions. However, Ta is also expected to have a stronger interaction with hydrogen isotopes, potentially limiting its use as a plasma-facing material. Despite these concerns, detailed investigations on hydrogen irradiation effects on Ta are scarce. In this study, pristine and fuzzy (He⁺ ion-irradiated) Ta samples are irradiated with 120 eV deuterium (D) ions at various temperatures and examined with a combination of thermal desorption spectroscopy (TDS), scanning electron microscopy (SEM), and optical reflectivity. TDS reveals discrete D desorption temperatures at 660 and 760 K, corresponding to trapping energies of 1.82 and 2.11 eV, respectively. Although D is retained in Ta both in higher quantities and at higher temperatures compared to W, extreme surface temperatures expected in tokamak divertors may exceed these desorption temperatures and counteract retention. Furthermore, this study indicates that Ta is relatively resistant to adverse surface structuring under D⁺ ion irradiation. In fact, D⁺ is shown to prevent and suppress Ta fuzz formation in sequential D⁺/He⁺ ion irradiation experiments. While further investigations are needed to elucidate this behavior, these initial investigations show a strong potential for the use of Ta as a PFC material.

与钨（W）相比，钽（Ta）在与熔化相关的辐照条件下对氦（He）诱导的表面形态变化表现出了更高的抵抗力。然而，还期望Ta与氢同位素具有更强的相互作用，可能会限制Ta作为面向等离子体的材料的用途。尽管有这些担忧，但很少有关于氢辐照对Ta的影响的详细研究。在这项研究中，原始和模糊（He ⁺离子辐照的Ta样品在各种温度下用120 eV氘（D）离子辐照，并结合热脱附光谱（TDS），扫描电子显微镜（SEM）和光学反射率进行检查。TDS揭示了660和760 K处离散的D解吸温度，分别对应于1.82和2.11 eV的俘获能。尽管与W相比，D以更高的量和更高的温度保留在Ta中，但在托卡马克分流器中预期的极端表面温度可能会超过这些解吸温度并抵消保留。此外，这项研究表明，Ta在D ⁺离子辐照下相对抵抗不良的表面结构。实际上，已证明D ⁺可以防止和抑制顺序D中Ta绒毛的形成⁺ / He ⁺离子辐照实验。尽管需要进一步的研究来阐明这种行为，但这些初步的研究显示出将Ta用作PFC材料的巨大潜力。