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Transparent highly oriented 3C-SiC bulks by halide laser CVD
Journal of the European Ceramic Society ( IF 5.8 ) Pub Date : 2018-03-12 , DOI: 10.1016/j.jeurceramsoc.2018.03.015
Hong Cheng , Meijun Yang , Youfeng Lai , Mingwei Hu , Qizhong Li , Rong Tu , Song Zhang , Mingxu Han , Takashi Goto , Lianmeng Zhang

Transparent and highly oriented 3C-SiC bulks were speedily fabricated at deposition temperature (Tdep) of 1623 K by halide laser chemical vapor deposition (HLCVD). The effect of total pressure (Ptot) on the optical transmittance, preferred orientation, microstructure, deposition rate (Rdep) and micro-hardness were investigated. The maximum Rdep of the transparent 3C-SiC reached 2450 μm/h at Ptot = 10 kPa. With an increase in Ptot, the transmittance of 3C-SiC bulks increased firstly, and then decreased. At Ptot = 10 kPa, 3C-SiC bulk, a highly <111>-oriented and low density of defects, showed the highest transmittance, greater than 55% in the wavelength range of 800–1100 nm. At Ptot = 4 kPa and 20 kPa, 3C-SiC bulks showed much lower transmittance, in which contained poorly oriented grains and numerous defects. The Vickers micro-hardness of 3C-SiC bulks increased with increasing Ptot and showed the highest value of 34.8 GPa at Ptot = 40 kPa.



中文翻译:

卤化物激光CVD制成的透明高取向3C-SiC块

通过卤化物激光化学气相沉积(HLCVD),在1623 K的沉积温度(T dep)下,快速制造出透明且高度取向的3C-SiC块体。研究了总压力(P tot)对光学透射率,择优取向,微观结构,沉积速率(R dep)和显微硬度的影响。透明3C-SiC的最大R depP tot  = 10 kPa时达到2450μm/ h 。随着P tot的增加,3C-SiC块体的透射率先上升,然后下降。在P TOT = 10 kPa,3C-SiC块体,高度<111>取向且缺陷密度低,显示出最高的透射率,在800-1100 nm的波长范围内大于55%。在P tot  = 4 kPa和20 kPa时,3C-SiC块体的透射率要低得多,其中包含取向差的晶粒和许多缺陷。3C-SiC块体的维氏显微硬度随P tot的增加而增加,并且在P tot  = 40 kPa时显示最高值为34.8 GPa 。

更新日期:2018-03-12
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