In this study cold low pressure radiofrequency oxygen plasma was used for the first time to inactivate toxicogenic fungi proliferation on saffron. Varieties of plasma produced reactive oxygen species which were investigated by optical emission spectroscopy. The data were indicative of the absence of UV radiation. Effects of plasma treatment on antioxidant activity, metabolic content, colour, odour and flavour parameters and physical impact on saffron were investigated. A range of plasma powers and exposure times were assayed in suppression of fungal growth. Amongst which power of 60 W for 15 min was used to eradicate Aspergillus and other microorganisms. The ferric reducing antioxidant power was changed from 1778.21 to 1674.25 mM/g dry weight following plasma treatment. Moreover, crocin ester, picrocrocin and safranal metabolites reduced insignificantly. Additionally, plasma had no significant impact on colour, odour and flavour of saffron.

在这项研究中，首次使用低温低压射频氧等离子体来灭活藏红花上的有毒真菌。各种等离子体产生的活性氧种类，通过光发射光谱法对其进行了研究。数据表明不存在紫外线辐射。研究了等离子体处理对抗氧化剂活性，代谢含量，颜色，气味和风味参数以及对藏红花的物理影响的影响。在抑制真菌生长中测定了一系列血浆能量和暴露时间。其中用60 W功率15分钟消灭曲霉和其他微生物。经过等离子处理后，还原性铁的抗氧化能力从1778.21改变为1674.25 mM / g干重。此外，番红花酯，苦瓜红花素和safranal代谢产物减少不明显。另外，血浆对藏红花的颜色，气味和风味没有显着影响。