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Rhodium doped InGaAs: A superior ultrafast photoconductor
Applied Physics Letters ( IF 3.5 ) Pub Date : 2018-03-05 , DOI: 10.1063/1.5016282
R. B. Kohlhaas 1 , B. Globisch 1 , S. Nellen 1 , L. Liebermeister 1 , M. Schell 1 , P. Richter 2 , M. Koch 2 , M. P. Semtsiv 3 , W. T. Masselink 3
Affiliation  

The properties of rhodium (Rh) as a deep-level dopant in InGaAs lattice matched to InP grown by molecular beam epitaxy are investigated. When InGaAs:Rh is used as an ultrafast photoconductor, carrier lifetimes as short as 100 fs for optically excited electrons are measured. Rh doping compensates free carriers so that a near intrinsic carrier concentration can be achieved. At the same time, InGaAs:Rh exhibits a large electron mobility of 1000 cm2/V s. Therefore, this material is a very promising candidate for application as a semi-insulating layer, THz antenna, or semiconductor saturable absorber mirror.

中文翻译:

掺铑 InGaAs:一种卓越的超快光电导体

研究了铑 (Rh) 作为 InGaAs 晶格中与通过分子束外延生长的 InP 相匹配的深能级掺杂剂的性质。当 InGaAs:Rh 用作超快光电导体时,测量到光激发电子的载流子寿命短至 100 fs。Rh 掺杂补偿自由载流子,从而可以实现接近本征载流子浓度。同时,InGaAs:Rh 表现出 1000 cm2/V s 的大电子迁移率。因此,这种材料非常适合用作半绝缘层、太赫兹天线或半导体可饱和吸收镜。
更新日期:2018-03-05
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