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Electrochemical synthesis of photoactive carbon-carbide structure on silicon in molten salt
Electrochemistry Communications ( IF 4.7 ) Pub Date : 2018-03-06 , DOI: 10.1016/j.elecom.2018.03.003
Eimutis Juzeliūnas , Derek J. Fray , Putinas Kalinauskas , Ignas Valsiūnas , Gediminas Niaura , Algis Selskis , Vitalija Jasulaitienė

Carbon-carbide coatings on silicon with a distinctively developed surface were electrochemically synthesized in molten CaCl2 using Si-SiO2 precursor and a graphite anode. Energy-dispersive X-ray spectroscopy showed approximately one quarter of the structure (in at.%) was composed of carbon. X-ray diffraction identified crystalline phases of graphite, silicon carbide and carbonate. X-ray photoelectron spectroscopy identified the carbide/carbon concentration ratio varied from 0.2 in the external region of the structure to 0.7 at the silicon substrate boundary. Mott-Schottky analysis showed p-type semiconductivity of the structure with high density of charge carriers N > 1016 cm−3. The surfaces absorbed over 90% of white light in a broad region of wavelengths from 400 nm to 1100 nm. The obtained composite is promising for application as an antireflection and protective coating or a photoelectrode.



中文翻译:

熔融盐中硅上光活性碳化物结构的电化学合成

使用Si-SiO 2前驱体和石墨阳极,在熔融的CaCl 2中电化学合成了表面上显着发达的硅上的碳化碳涂层。能量色散X射线光谱显示约四分之一的结构(以原子%计)由碳组成。X射线衍射鉴定出石墨,碳化硅和碳酸盐的结晶相。X射线光电子能谱分析表明,碳化物/碳的浓度比从结构外部区域的0.2到硅衬底边界的0.7不等。Mott-Schottky分析显示具有高载流子密度N  > 10 16  cm -3的结构的p型半导电性。这些表面在400 nm至1100 nm的宽波长区域中吸收了90%以上的白光。所获得的复合材料有望用作抗反射和保护涂层或光电极。

更新日期:2018-03-06
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