A novel, poly(dimethyl siloxane)-based photopolymer that exhibits simultaneous linear chain extension and crosslinking was suitable for vat photopolymerization additive manufacturing. Photopolymer compositions consisted of dithiol and diacrylate functional poly(dimethyl siloxane) oligomers, where simultaneous thiol-ene coupling and free radical polymerization provided for linear chain extension and crosslinking, respectively. Compositions possessed low viscosity before printing and the modulus and tensile strain at break of a photocured, higher molecular weight precursor after printing. Photorheology and soxhlet extraction demonstrated highly efficient photocuring, revealing a calculated molecular weight between crosslinks of 12,600 g/mol and gel fractions in excess of 90% while employing significantly lower molecular weight precursors (i.e. < 5300 g/mol). These photocured objects demonstrated a 2× increase in tensile strain at break as compared to a photocured 5300 g/mol PDMS diacrylamide alone. These results are broadly applicable to the advanced manufacturing of objects requiring high elongation at break.

新颖的，同时显示线性扩链和交联的，基于聚（二甲基硅氧烷）的光敏聚合物适用于大桶光聚合添加剂的生产。光聚合物组合物由二硫醇和二丙烯酸酯官能的聚（二甲基硅氧烷）低聚物组成，其中同时进行的硫醇-烯偶联和自由基聚合分别用于线性扩链和交联。组合物在印刷前具有低粘度，在印刷后具有光固化的较高分子量前体的断裂模量和拉伸应变。光流变学和索氏萃取证明了高效的光固化性，揭示了计算出的12,600 g / mol交联键之间的分子量和超过90％的凝胶分数，同时采用了分子量显着较低的前体（即< 5300 g / mol）。与仅光固化的5300 g / mol PDMS二丙烯酰胺相比，这些光固化的物体表现出断裂拉伸应变增加了2倍。这些结果广泛适用于需要高断裂伸长率的物体的高级制造。