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Tunable Antireflection Coating to Remove Index‐Matching Requirement for Interference Lithography
Advanced Optical Materials ( IF 8.0 ) Pub Date : 2018-02-23 , DOI: 10.1002/adom.201701049 Daniel A. Bacon-Brown 1 , Paul V. Braun 1
Advanced Optical Materials ( IF 8.0 ) Pub Date : 2018-02-23 , DOI: 10.1002/adom.201701049 Daniel A. Bacon-Brown 1 , Paul V. Braun 1
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Interference lithography is a flexible technique for creating 3D periodic nano‐ and microstructures that can be used to make a wide variety of crystal lattices, but as it is found, some lattices require index‐matched substrates to eliminate reflections at the photoresist–substrate interface. In this study a tunable‐refractive index quarter wavelength‐thickness polystyrene/poly(vinyl methyl ether) homopolymer blend backside antireflection coating, which alleviates this issue, is presented. The coating's refractive index can be tuned from 1.47 to 1.6, drastically reducing reflections at the photoresist–substrate interface for substrates with refractive indices as low as 1.35 for normal incidence and even lower for angled illumination. By injecting the light through the substrate and applying the antireflection layer to the top of the photoresist, interference lithography can even be performed on high refractive index substrates, such as indium tin oxide (ITO)‐coated glass. Fabrication of hexagonal, face‐centered cubic, and simple cubic lattices in SU‐8 photoresist (refractive index of 1.59) is demonstrated using 532 nm laser light on nonindex matched substrates including ITO‐coated glass and borosilicate glass, and the effects of reflection interference on the photonic bandstructure are investigated.
中文翻译：
可调节的抗反射涂层，消除了干涉光刻的折射率匹配要求
干涉光刻技术是一种灵活的技术，可用于创建3D周期性的纳米和微观结构，该结构可用于制造各种晶格，但发现某些晶格需要折射率匹配的基板才能消除光致抗蚀剂与基板界面的反射。在这项研究中，提出了一种可减轻折射率的四分之一波长厚度的聚苯乙烯/聚（乙烯基甲基醚）均聚物共混背面防反射涂层。可以将涂层的折射率从1.47调整到1.6，从而大大降低了法线入射的折射率在低至1.35且角度照明更低的情况下在光致抗蚀剂-基板界面处的反射。通过将光线穿过基板注入并将防反射层施加到光刻胶的顶部，干涉光刻甚至可以在高折射率基板上进行，例如氧化铟锡（ITO）涂层的玻璃。使用532 nm激光在非折射率匹配的基板（包括ITO涂层玻璃和硼硅酸盐玻璃）上演示了SU-8光阻（折射率为1.59）中六边形，面心立方和简单立方晶格的制造，以及反射干扰的影响对光子的能带结构进行了研究。
更新日期：2018-02-23
中文翻译：
可调节的抗反射涂层，消除了干涉光刻的折射率匹配要求
干涉光刻技术是一种灵活的技术，可用于创建3D周期性的纳米和微观结构，该结构可用于制造各种晶格，但发现某些晶格需要折射率匹配的基板才能消除光致抗蚀剂与基板界面的反射。在这项研究中，提出了一种可减轻折射率的四分之一波长厚度的聚苯乙烯/聚（乙烯基甲基醚）均聚物共混背面防反射涂层。可以将涂层的折射率从1.47调整到1.6，从而大大降低了法线入射的折射率在低至1.35且角度照明更低的情况下在光致抗蚀剂-基板界面处的反射。通过将光线穿过基板注入并将防反射层施加到光刻胶的顶部，干涉光刻甚至可以在高折射率基板上进行，例如氧化铟锡（ITO）涂层的玻璃。使用532 nm激光在非折射率匹配的基板（包括ITO涂层玻璃和硼硅酸盐玻璃）上演示了SU-8光阻（折射率为1.59）中六边形，面心立方和简单立方晶格的制造，以及反射干扰的影响对光子的能带结构进行了研究。
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