Gene Expression on DNA Biochips Patterned with Strand‐Displacement Lithography,Angewandte Chemie International Edition

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Gene Expression on DNA Biochips Patterned with Strand‐Displacement Lithography
Angewandte Chemie International Edition ( IF 16.1 ) Pub Date : 2018-03-15 , DOI: 10.1002/anie.201800281
Günther Pardatscher ₁ , Matthaeus Schwarz-Schilling ₁ , Shirley S. Daube ₂ , Roy H. Bar-Ziv ₂ , Friedrich C. Simmel ₁

Affiliation

Lithographic patterning of DNA molecules enables spatial organization of cell‐free genetic circuits under well‐controlled experimental conditions. Here, we present a biocompatible, DNA‐based resist termed “Bephore”, which is based on commercially available components and can be patterned by both photo‐ and electron‐beam lithography. The patterning mechanism is based on cleavage of a chemically modified DNA hairpin by ultraviolet light or electrons, and a subsequent strand‐displacement reaction. All steps are performed in aqueous solution and do not require chemical development of the resist, which makes the lithographic process robust and biocompatible. Bephore is well suited for multistep lithographic processes, enabling the immobilization of different types of DNA molecules with micrometer precision. As an application, we demonstrate compartmentalized, on‐chip gene expression from three sequentially immobilized DNA templates, leading to three spatially resolved protein‐expression gradients.

中文翻译：

用链位移平版印刷术设计的DNA生物芯片上的基因表达

DNA分子的光刻技术可以在控制良好的实验条件下实现无细胞遗传电路的空间组织。在这里，我们介绍了一种基于生物相容性，基于DNA的抗蚀剂，称为“ Bephore”，该抗蚀剂基于市售组件，可以通过光电子束光刻技术进行图案化。图案化机制是基于紫外线或电子对化学修饰的DNA发夹的切割，以及随后的链置换反应。所有步骤均在水溶液中进行，不需要对抗蚀剂进行化学显影，这使光刻工艺稳定且具有生物相容性。Bephore非常适合于多步光刻工艺，能够以微米级精度固定不同类型的DNA分子。作为应用，

更新日期：2018-03-15

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