In this paper, we selected a less studied high-speed dispersive homogenizer as a shear-exfoliating device and selected NMP which matches the surface energy of MoS₂ as a solvent to prepare few-layer MoS₂ nanosheets. The effects of operating parameters on the concentration of few-layer MoS₂ nanosheets were systematically studied. The results showed that the change of operating conditions has a direct influence on the exfoliation effects. The concentration of MoS₂ nanosheets was 0.96 mg/mL in pure NMP under the optimized conditions. The concentration reached 1.44 mg/mL, and the highest yield was 4.8% after adding sodium citrate. Particularly, their lateral size is about 50–200 nm, in which almost 65% of MoS₂ nanosheets are less than four layers and 9% are monolayer. It was verified that the as-used exfoliation method is simple and highly efficient.

中文翻译：

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高效剪切剥落法制备少量MoS ₂纳米片

在本文中，我们选择了一种研究较少的高速分散均质机作为剪切剥落装置，并选择了与MoS ₂的表面能相匹配的NMP作为溶剂，以制备多层MoS ₂纳米片。系统地研究了操作参数对几层MoS ₂纳米片浓度的影响。结果表明，工作条件的变化直接影响剥离效果。在优化的条件下，纯NMP中MoS ₂纳米片的浓度为0.96 mg / mL。加入柠檬酸钠后，浓度达到1.44 mg / mL，最高产率为4.8％。特别是，它们的横向尺寸约为50-200 nm，其中近65％的MoS ₂纳米片少于四层，而9％是单层。证实了所使用的去角质方法简单且高效。