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Chemical Vapor Deposition Growth and Applications of Two-Dimensional Materials and Their Heterostructures
Chemical Reviews ( IF 51.4 ) Pub Date : 2018-01-31 00:00:00 , DOI: 10.1021/acs.chemrev.7b00536
Zhengyang Cai 1 , Bilu Liu 1 , Xiaolong Zou 1 , Hui-Ming Cheng 1, 2, 3
Affiliation  

Two-dimensional (2D) materials have attracted increasing research interest because of the abundant choice of materials with diverse and tunable electronic, optical, and chemical properties. Moreover, 2D material based heterostructures combining several individual 2D materials provide unique platforms to create an almost infinite number of materials and show exotic physical phenomena as well as new properties and applications. To achieve these high expectations, methods for the scalable preparation of 2D materials and 2D heterostructures of high quality and low cost must be developed. Chemical vapor deposition (CVD) is a powerful method which may meet the above requirements, and has been extensively used to grow 2D materials and their heterostructures in recent years, despite several challenges remaining. In this review of the challenges in the CVD growth of 2D materials, we highlight recent advances in the controlled growth of single crystal 2D materials, with an emphasis on semiconducting transition metal dichalcogenides. We provide insight into the growth mechanisms of single crystal 2D domains and the key technologies used to realize wafer-scale growth of continuous and homogeneous 2D films which are important for practical applications. Meanwhile, strategies to design and grow various kinds of 2D material based heterostructures are thoroughly discussed. The applications of CVD-grown 2D materials and their heterostructures in electronics, optoelectronics, sensors, flexible devices, and electrocatalysis are also discussed. Finally, we suggest solutions to these challenges and ideas concerning future developments in this emerging field.

中文翻译:

二维材料的化学气相沉积生长及应用及其异质结构

二维(2D)材料已经吸引了越来越多的研究兴趣,因为具有丰富多样的电子,光学和化学特性的材料可供选择。此外,基于2D材料的异质结构结合了几种单独的2D材料,提供了独特的平台来创建几乎无限数量的材料,并显示出奇特的物理现象以及新的特性和应用。为了达到这些很高的期望,必须开发出可扩展的高质量和低成本2D材料和2D异质结构制备方法。化学气相沉积(CVD)是一种强大的方法,可以满足上述要求,并且尽管存在一些挑战,但近年来已广泛用于生长2D材料及其异质结构。在对2D材料的CVD生长挑战的回顾中,我们重点介绍了单晶2D材料的可控生长方面的最新进展,重点是半导体过渡金属二卤化物。我们提供有关单晶2D域生长机制的知识,以及用于实现连续和均匀2D膜的晶圆级生长的关键技术,这对于实际应用很重要。同时,详细讨论了设计和生长各种基于2D材料的异质结构的策略。还讨论了CVD生长的2D材料及其异质结构在电子,光电,传感器,柔性设备和电催化中的应用。最后,我们为这些挑战和有关这一新兴领域未来发展的想法提出了解决方案。
更新日期:2018-01-31
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