Abstract During the formation of distinct bilayer NiGePt alloy, a phase-separation phenomenon was observed using microwave annealing and structural engineering. The microstructures of bilayer NiGePt [PtGe(Ni)–NiGe(Pt)] alloys fabricated with 10-nm Ni and various thicknesses of Pt (5, 10, and 15 nm) were characterized. Within the same thermal budget as microwave annealing, the diffusion of Ni exhibited stronger alloy formation ability with Ge and drilled through the Pt layer without resistance. The higher diffusivity of Ni atoms dominated the diffusion of Ni through the Pt layer to form a stable crystalline layer, NiGe(Pt). Ge diffused outwardly toward the Pt layer to form a PtGe(Ni) layer. This special phenomenon of bilayer alloy formation was elucidated using nanobeam electron diffraction by transmission electron microscopy in conjunction with energy-dispersive spectrometry. Comparing the differences in metal alloys between microwave and rapid thermal annealing, microwave annealing formed a bilayer alloy more apparently than rapid thermal annealing. The results and electrical characteristics indicated that a thicker Pt layer for forming a bilayer NiGePt alloy with alloy separation could also effectively improve the leakage current of NiGePt [PtGe(Ni)– NiGe(Pt)]/n-Ge Schottky junctions.

中文翻译：

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微波退火NiGePt合金在n-Ge上的相分离现象

摘要 在形成独特的双层NiGePt 合金的过程中，使用微波退火和结构工程观察到相分离现象。表征了用 10-nm Ni 和各种厚度的 Pt（5、10 和 15 nm）制造的双层 NiGePt [PtGe(Ni)-NiGe(Pt)] 合金的微观结构。在与微波退火相同的热预算内，Ni 的扩散表现出与 Ge 更强的合金形成能力，并且无阻力地钻穿 Pt 层。Ni原子的较高扩散率支配着Ni通过Pt层的扩散以形成稳定的结晶层NiGe(Pt)。Ge向外扩散到Pt层以形成PtGe(Ni)层。使用纳米束电子衍射通过透射电子显微镜结合能量色散光谱法阐明了双层合金形成的这种特殊现象。比较微波和快速热退火在金属合金方面的差异，微波退火比快速热退火更明显地形成双层合金。结果和电学特性表明，用于形成具有合金分离的双层 NiGePt 合金的较厚 Pt 层也可以有效地改善 NiGePt [PtGe(Ni)-NiGe(Pt)]/n-Ge 肖特基结的漏电流。