The authors note that there is an extra incorrect citation for Fig. S5 appeared on page 2770. It has also come to our attention that Figs. 5 and 6 appeared incorrectly. The correct figures and their legend appear below. These errors don’t affect the conclusions of the article.

Figure 5

(a) Typical SEM image (scale bar: 1 μm), inset shows the close magnification of two overlapping branched NWs (NS-NWs), scale bar is 100 nm. (b) TEM observation of prepared samples (scale bar: 1 μm) and (c) a single NS-NW (scale bar: 100 nm), where the inset of panel (c) is the corresponding selected area electron diffraction (SAED) pattern. (d) EDS point scanning data from the three regions of the NS-NW. Scale bar: 100 nm. Al signals generated from the Al substrate. (e) Cu and (f) O elemental distribution across the axis of the heterostructures.

Figure 6

Typical galvanostatic charge–discharge curves of (a) Cu/Cu₂O/CuO NS-NW and (b) Cu/Cu₂O/CuO NW cells at a current density of 100 mA·g⁻¹ in the range 0.005–3 V vs. Li. (c) Cyclic voltammograms of the Cu/Cu₂O/CuO NS-NW cell cycled between 0.02–3 V vs. Li at a scan rate of 2 mV·s⁻¹. (d) Cycling performances of Cu/Cu₂O/CuO NS-NW (black) and Cu/Cu₂O/CuO NW cells (red). Inset: corresponding TEM images of triplex components NS-NW (black framed) and NW (red framed). (e) Representative charge and discharge voltage profiles of Cu/Cu₂O/CuO NS-NW cell at various current densities. (f) Capacity retention of Cu/Cu₂O/CuO NS-NW (black) and Cu/Cu₂O/CuO NW (red) cells at different current rates.

中文翻译：

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勘误：锂离子电池超支化Cu / Cu 2 O / CuO核-壳纳米线异质结构的外延生长

作者注意到，图2出现在第2770页上，这是一个额外的错误引用。5和6出现错误。正确的数字及其图例显示在下面。这些错误不会影响本文的结论。