This paper describes investigations (a) on the efficacy of Ti layer as a barrier against the intermixing of Pd and Mg in Pd/Ti/Mg films and (b) the hydrogen storage characteristics of the tri-layered films and the related bulk composites. The Mg film was prepared by resistive evaporation while the Pd and Ti films were deposited by e-beam evaporation. The analysis by Rutherford backscattering spectrometry (RBS) and glancing-incidence X-ray diffraction (GI-XRD) of the Pd/Ti/Mg/Si(substrate) films annealed in vacuum in 348–573 K temperature range revealed that Ti effectively prevents the intermixing of Pd and Mg up to ∼523 K. However, mixing across Pd/Ti, Ti/Mg and Mg/Si interfaces commences around 523 K that progresses with the temperature of annealing though PdMg phases are not formed even at 573 K. The as-deposited Pd/Ti/Mg films are hydrogenated to ∼7 wt % (62 at%) at 323–423 K at 0.15 MPa hydrogen pressure and dehydrogenated completely at ∼ 473 K. The extent of (de)hydrogenation of the films was determined non-destructively by the ¹H(¹⁹F,αγ)¹⁶O nuclear reaction. The powder composites derived from the films, on the other hand, reversibly stored ∼2.2 wt% hydrogen up to 18 cycles in 323–473 K temperature range. The superior cyclic stability is attributed to the inhibition of mixing between Pd and Mg and, as a result, the formation of PdMg inter-metallics by titanium.

本文描述了以下研究：（a）Ti层作为防止Pd / Ti / Mg膜中Pd和Mg混合的屏障的功效，以及（b）三层膜和相关的块状复合材料的储氢特性。Mg膜是通过电阻蒸发制备的，而Pd和Ti膜是通过电子束蒸发沉积的。通过卢瑟福背散射光谱（RBS）和掠入X射线衍射（GI-XRD）对在348-573 K温度范围内真空退火的Pd / Ti / Mg / Si（衬底）薄膜进行的分析表明，Ti有效地防止了Pd和Mg的混合高达523K。但是，Pd / Ti，Ti / Mg和Mg / Si界面之间的混合开始于523 K左右，并随着Pd退火温度的升高而发展。即使在573 K时也不会形成Mg相。沉积的Pd / Ti / Mg膜在0.15 MPa的氢气压力下于323–423 K时被氢化至〜7 wt％（62 at％），并在〜473 K时完全脱氢。膜的（脱）氢化程度是通过¹ H（¹⁹ F，αγ）¹⁶ O核反应无损确定的。另一方面，由薄膜制成的粉末复合材料可在323–473 K温度范围内以18个循环可逆地存储约2.2 wt％的氢。优异的循环稳定性归因于抑制Pd和Mg之间的混合，结果是钛形成了Pd Mg金属间化合物。