Perpendicular Orientation of Diblock Copolymers Induced by Confinement between Graphene Oxide Sheets,Langmuir

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Perpendicular Orientation of Diblock Copolymers Induced by Confinement between Graphene Oxide Sheets
Langmuir ( IF 3.7 ) Pub Date : 2018-01-17 00:00:00 , DOI: 10.1021/acs.langmuir.7b03991
Ki-In Choi _{1,

2} , Tae-Ho Kim ₁ , Yeonhee Lee ₃ , Hyeri Kim ₁ , Hoyeon Lee ₁ , Guangcui Yuan ₄ , Sushil K. Satija ₄ , Jae-Hak Choi ₂ , Hyungju Ahn ₅ , Jaseung Koo ₁

Affiliation

We have studied an orientation structure of self-assembled block copolymers (dPS-b-PMMA) of deuterated polystyrene (dPS) and poly(methyl methacrylate) (PMMA) confined between graphene oxide (GO) surfaces. The results of combination techniques, such as neutron reflectivity, time-of-flight secondary-ion mass spectrometry, grazing-incidence small-angle X-ray scattering, and scanning electron microscopy, show that self-assembled domains of the block copolymers in thin films near the GO sheets are oriented perpendicular to the surface of the GO monolayers, in contrast to the horizontal lamellar structure of the copolymer thin film in the absence of the GO monolayers. This is due to the amphiphilic nature of the GO, which leads to a nonpreferential interaction of both dPS and PMMA blocks. Double-sided confinement with the GO monolayers further extends the ordering behavior of the dPS-b-PMMA thin films. Continuous vertical orientation of the block copolymer thin films is also obtained in the presence of alternating GO layers within thick copolymer films.

中文翻译：

限制氧化石墨烯片之间诱导的二嵌段共聚物的垂直取向

我们研究了自组装嵌段共聚物（dPS- b氘化聚苯乙烯（dPS）和聚（甲基丙烯酸甲酯）（PMMA）限定在氧化石墨烯（GO）表面之间。中子反射率，飞行时间二次离子质谱，掠入射小角X射线散射和扫描电子显微镜等组合技术的结果表明，嵌段共聚物的自组装域在与GO薄层附近的薄膜取向垂直于GO单层的表面，这与不存在GO单层的情况下共聚物薄膜的水平层状结构形成了鲜明的对比。这是由于GO的两亲性导致了dPS和PMMA嵌段的非优先相互作用。GO单层的双面约束进一步扩展了dPS- b的有序行为-PMMA薄膜。在厚共聚物膜中存在交替的GO层的情况下，也可获得嵌段共聚物薄膜的连续垂直取向。

更新日期：2018-01-17

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