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Preparation of highly hydrophobic CeO 2 films using glancing angle deposition
Materials Letters ( IF 2.7 ) Pub Date : 2018-04-01 , DOI: 10.1016/j.matlet.2018.01.006
Tao An , Xiaofang Deng , Yuxin Gao , Shujie Liu , Chunyue Dou , Jinning Ju

Abstract Atomic shadowing during kinetically limited physical vapor deposition usually causes the formation of one-dimensional nanostructures with novel shapes. In this letter, we report the variety of surface topography and shapes of columns of CeO2 films deposited at different temperatures using glancing angle deposition (GLAD) technique. The wettability of the films was also investigated. Rough and triangular pyramid surface and regular nanorods were successfully obtained at a deposition temperature of 400 °C. Water contact angle (WCA) tests show that the rougher and regular the surface is, the higher WCA we get, and a maximum WCA of 143.2° was obtained at the temperature of 400 °C.

中文翻译:

使用掠射角沉积制备高疏水性CeO 2 薄膜

摘要 动力学受限的物理气相沉积过程中的原子阴影通常会导致形成具有新形状的一维纳米结构。在这封信中,我们报告了使用掠射角沉积 (GLAD) 技术在不同温度下沉积的 CeO2 薄膜柱的各种表面形貌和形状。还研究了薄膜的润湿性。在 400 °C 的沉积温度下成功获得了粗糙的三角锥表面和规则的纳米棒。水接触角 (WCA) 测试表明,表面越粗糙和规则,我们得到的 WCA 就越高,在 400°C 的温度下获得的最大 WCA 为 143.2°。
更新日期:2018-04-01
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