Metallic Fe-Ti alloy thin films were deposited by high-power impulse magnetron sputtering (HiPIMS) on a glass substrate with an FTO electrode. Two-component alloys were prepared by sputtering of a single target, which was composed from two sectors made from different elements: iron disc and titanium ring. Chemical composition of alloy thin films was controlled by the width of titanium ring that partially covered iron target. These alloy thin films were anodized in fluorine-containing electrolyte with the aim to create mixed oxide nanostructures. Anodized layers were amorphous and transparent. After calcination, the layers consisted of crystalline Fe₂O₃ although TiO₂ was still amorphous. Photoelectrochemical characterization show that increasing amount of titanium in the alloy results in the fabrication of Fe₂O₃/TiO₂ nanostructures with higher photocurrent compared to those prepared from pure iron by the same anodization technique.

通过高功率脉冲磁控溅射（HiPIMS）在具有FTO电极的玻璃基板上沉积金属Fe-Ti合金薄膜。通过溅射单个靶材来制备两组分合金，该靶材由两个由不同元素制成的扇形组成：铁盘和钛环。合金薄膜的化学成分由部分覆盖铁靶的钛环的宽度控制。这些合金薄膜在含氟电解质中进行阳极氧化，目的是产生混合氧化物纳米结构。阳极氧化层是无​​定形的和透明的。煅烧后，各层由结晶的Fe ₂ O _3组成，尽管是TiO ₂仍然是无定形的 光电化学特征表明，与通过相同阳极氧化技术由纯铁制备的那些相比，合金中钛含量的增加导致具有更高光电流的Fe ₂ O ₃ / TiO ₂纳米结构的制造。