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Nanowires: Controlled Selective CVD Growth of ZnO Nanowires Enabled by Mask‐Free Fabrication Approach using Aqueous Fe Catalytic Inks (Adv. Mater. Interfaces 24/2017)
Advanced Materials Interfaces ( IF 4.3 ) Pub Date : 2017-12-21 , DOI: 10.1002/admi.201770129
Dheyaa Alameri 1 , Leonidas E. Ocola 2 , Irma Kuljanshvili 1
Affiliation  

In their article number 1700950 Irma Kuljanshvili and co‐workers from Saint Louis University and Argonne National Laboratory demonstrate a novel mask free direct‐writing approach that enables fabrication of ZnO NWs using catalytic iron aqueous ink. Location specific CVD grow ZnO nanowires (NWs) with controlled geometry and morphology are shown to create seamless and robust lateral interface with Pt metal electrode and vertical interface with the substrate. Precisely engineered architecture and interfaces of ZnO nanostructures can promote variety of new applications.
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中文翻译:

纳米线:通过使用无水氧化铁油墨的无掩模制造方法实现的ZnO纳米线的选择性CVD控制生长(高级材料接口24/2017)

圣路易斯大学和阿贡国家实验室的Irma Kuljanshvili及其同事在其文章编号1700950中展示了一种新颖的无掩模直写方法,该方法能够使用催化铁水性油墨制造ZnO NW。位置特定的CVD生长ZnO纳米线(NW)具有可控的几何形状和形态,显示可与Pt金属电极形成无缝且坚固的横向界面,并与衬底形成垂直界面。精确设计的ZnO纳米结构的体系结构和界面可以促进各种新应用。
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更新日期:2017-12-21
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