A focused review of photoresist strategies that have been studied over the past few decades driven by the demands of Moore’s law. Selected results are discussed with emphasis on the choice of photoresist chemistry depending on the particulars of each radiation type or patterning strategy, while we present special architectures of photoresists that have attracted a great interest in the semiconductor field.

中文翻译：

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追求摩尔定律：聚合物化学在行动

对过去几十年来受摩尔定律要求驱动的光刻胶策略的重点回顾。讨论了选定的结果，重点是根据每种辐射类型或图案化策略的细节选择光刻胶化学，同时我们介绍了在半导体领域引起极大兴趣的特殊光刻胶结构。