Abstract Magnetic properties of trilayer double-exchange biased Si/Ta(30 nm)/NixFe(1−x)(10 nm)/IrMn(tAF)/NixFe(1−x(10 нм)/Ta(30 нм) thin film structures with x = 0.4 and x = 0.75 were investigated. The exchange bias, noncollinearity of unidirectional and uniaxial anisotropy and magnetization in both bottom and top ferromagnetic layers as a function of the antiferromagnetic (AF) layer thickness in the range from 2 to 50 nm were investigated. The obtained effects support the model of ferromagnetic coupling through the antiferromagnetic spacer and the model of rotatable anisotropy contribution at small AF thickness. It was found that usage of low-nickel permalloy in exchange biased systems has advantages of higher magnetization, a higher magnetic ordering at the interface and smaller critical thickness of antiferromagnetic layer to set the exchange bias, though provides a lower exchange bias compared with normal permalloy composition.

中文翻译：

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具有高和低 Ni 相对含量的交换偏置 NiFe/IrMn/NiFe 三层的 FMR 研究

摘要 三层双交换偏置 Si/Ta(30 nm)/NixFe(1−x)(10 nm)/IrMn(tAF)/NixFe(1−x(10 нм)/Ta(30 нм) 薄膜的磁性研究了 x = 0.4 和 x = 0.75 的结构。底部和顶部铁磁层的交换偏置、单向和单轴各向异性的非共线性和磁化强度是 2 到 50 nm 范围内反铁磁 (AF) 层厚度的函数研究了获得的效应支持通过反铁磁垫片的铁磁耦合模型和小AF厚度下的可旋转各向异性贡献模型。发现在交换偏置系统中使用低镍坡莫合金具有更高的磁化强度，界面处较高的磁序和较小的反铁磁层临界厚度以设置交换偏置，尽管与正常坡莫合金成分相比提供了较低的交换偏置。