Molecular Tailoring of Poly(styrene-b-methyl methacrylate) Block Copolymer Toward Perpendicularly Oriented Nanodomains with Sub-10 nm Features,ACS Macro Letters

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Molecular Tailoring of Poly(styrene-b-methyl methacrylate) Block Copolymer Toward Perpendicularly Oriented Nanodomains with Sub-10 nm Features
ACS Macro Letters ( IF 5.1 ) Pub Date : 2017-11-30 00:00:00 , DOI: 10.1021/acsmacrolett.7b00856
Sanghoon Woo ₁ , Seongjun Jo ₂ , Du Yeol Ryu ₂ , Soo-Hyung Choi ₃ , Youngson Choe ₄ , Anzar Khan ₁ , June Huh ₁ , Joona Bang ₁

Affiliation

We demonstrate a novel approach for fabricating vertically orientated, sub-10 nm, block copolymer (BCP) nanodomains on a substrate via molecular tailoring of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) BCP, one of the most widely used BCPs for nanopatterning. The idea is to incorporate a short middle block of self-attracting poly(methacrylic acid) (PMAA) between the PS and PMMA blocks, where the PMAA middle block promotes phase separation between PS and PMMA, while maintaining the domain orientation perpendicular to the substrate. The designed PS-b-PMAA-b-PMMA triblock copolymers, which were synthesized via well-controlled anionic polymerization, exhibited order–disorder transition temperatures higher than that of pristine PS-b-PMMA BCPs, indicating the promotion of phase separation by the middle PMAA block. For PS-b-PMAA-b-PMMA BCPs with total molecular weights of 21 and 18 kg/mol, the domain spacing corresponds to 19.3 and 16.7 nm, respectively, allowing us to fabricate sub-10 nm nanodomain structures. More importantly, it was demonstrated that the PMAA middle block, which has a higher surface energy than PS and PMMA, does not significantly alter lateral concentration fluctuations, which are responsible for phase-separation in the lateral direction. This enabled the vertical orientation of microdomains with sub-10 nm feature size on a PS-r-PMMA neutral surface without an additional neutral top layer. We anticipate that this approach provides an important platform for next-generation lithography and nanopatterning applications that require sub-10 nm features over large areas with simple process and reduced cost.

中文翻译：

聚（苯乙烯-b-甲基丙烯酸甲酯）嵌段共聚物向具有亚 10 nm 特征的垂直定向纳米域的分子剪裁

我们展示了一种通过聚（苯乙烯-b-甲基丙烯酸甲酯）（PS- b -PMMA）BCP的分子定制在基板上制造垂直取向的亚 10 nm 嵌段共聚物（BCP）纳米域的新方法，这是最广泛用于纳米图案化的 BCP。这个想法是在 PS 和 PMMA 块之间加入一个短的自吸引聚（甲基丙烯酸）（PMAA）中间块，其中 PMAA 中间块促进 PS 和 PMMA 之间的相分离，同时保持垂直于衬底的畴取向. 设计的 PS- b -PMAA- b -PMMA 三嵌段共聚物是通过良好控制的阴离子聚合合成的，其有序-无序转变温度高于原始 PS-b -PMMA BCPs，表明中间 PMAA 块促进相分离。对于总分子量为 21 和 18 kg/mol 的PS- b -PMAA- b -PMMA BCP，域间距分别对应于 19.3 和 16.7 nm，使我们能够制造亚 10 nm 纳米域结构。更重要的是，证明了具有比 PS 和 PMMA 更高的表面能的 PMAA 中间块不会显着改变导致横向相分离的横向浓度波动。这使得在 PS- r上具有亚 10 nm 特征尺寸的微域的垂直方向成为可能-PMMA 中性表面，没有额外的中性顶层。我们预计这种方法为下一代光刻和纳米图案应用提供了一个重要的平台，这些应用需要在大面积上使用亚 10 nm 特征，工艺简单，成本降低。

更新日期：2017-11-30

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