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Bi2O2CO3 Growth at Room Temperature: In Situ X-ray Diffraction Monitoring and Thermal Behavior
ACS Omega ( IF 3.7 ) Pub Date : 2017-11-20 00:00:00 , DOI: 10.1021/acsomega.7b01359
René Moré 1 , Michael Olah 1 , S. Esmael Balaghi 1 , Philipp Jäker 2 , Sebastian Siol 3 , Ying Zhou 4 , Greta R. Patzke 1
Affiliation  

The room-temperature formation of bismuth oxycarbonate (Bi2O2CO3) from Bi2O3 in sodium carbonate buffer was investigated with in situ powder X-ray diffraction (PXRD) in combination with electron microscopy and vibrational spectroscopy. Time-resolved PXRD measurements indicate a pronounced and rather complex pH dependence of the reaction mechanism. Bi2O2CO3 formation proceeds within a narrow window between pH 8 and 10 via different mechanisms. Although a zero-dimensional nucleation model prevails around pH 8, higher pH values induce a change toward a diffusion-controlled model, followed by a transition to regular nucleation kinetics. Ex situ synthetic and spectroscopic studies confirm these trends and demonstrate that in situ monitoring affords vital parameter information for the controlled fabrication of Bi2O2CO3 materials. Furthermore, the β → α bismuth oxide transformation temperatures of Bi2O2CO3 precursors obtained from different synthetic routes differ notably (by min 50 °C) from commercially available bismuth oxide. Parameter studies suggest a stabilizing role of surface carbonate ions in the as-synthesized bismuth oxide sources. Our results reveal the crucial role of multiple preparative history parameters, especially of pH value and source materials, for the controlled access to bismuth oxide-based catalysts and related functional compounds.

中文翻译:

Bi 2 O 2 CO 3在室温下的生长:原位X射线衍射监测和热行为

利用原位粉末X射线衍射(PXRD)结合电子显微镜和振动光谱研究了碳酸钠缓冲液中Bi 2 O 3在室温下由Bi 2 O 3形成的碳酸氧铋(Bi 2 O 2 CO 3)的室温形成。时间分辨的PXRD测量表明反应机理对pH的依赖性很强。Bi 2 O 2 CO 3通过不同的机理,pH值在8和10之间的狭窄窗口内形成。尽管零维成核模型在pH值8左右普遍存在,但较高的pH值会导致向扩散控制模型的转变,然后过渡到规则成核动力学。异位合成和光谱研究证实了这些趋势,并证明了原位监测可为Bi 2 O 2 CO 3材料的受控制造提供重要的参数信息。此外,Bi 2 O 2 CO 3的β→α氧化铋转变温度从不同的合成途径获得的前驱体与市售的氧化铋显着不同(至少50°C)。参数研究表明表面碳酸根离子在合成的氧化铋源中具有稳定作用。我们的结果揭示了多种制备历史参数(尤其是pH值和原料)的关键作用,对于受控获取基于氧化铋的催化剂和相关功能化合物具有至关重要的作用。
更新日期:2017-11-20
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