Enhanced Electrical Properties and Air Stability of Amorphous Organic Thin Films by Engineering Film Density,The Journal of Physical Chemistry Letters

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Enhanced Electrical Properties and Air Stability of Amorphous Organic Thin Films by Engineering Film Density
The Journal of Physical Chemistry Letters ( IF 4.8 ) Pub Date : 2017-11-21 00:00:00 , DOI: 10.1021/acs.jpclett.7b02808
Yu Esaki _{1,

2} , Takeshi Komino _{1,

2,

3} , Toshinori Matsushima _{1,

2,

4} , Chihaya Adachi _{1,

2,

3,

4}

Affiliation

The influences of film density and molecular orientation on the carrier conduction and air stability of vacuum-deposited amorphous organic films of N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (α-NPD) were investigated. The substrate temperature (T_sub) during vacuum deposition had different effects on the film density and molecular orientation of α-NPD. Film density was a concave function of T_sub; maximum density was attained at T_sub = 270–300 K. α-NPD molecules were randomly oriented at T_sub = 342 K, and their horizontal orientation on the substrate became dominant as T_sub decreased. Hole current and air stability were clearly raised by increasing the film density by 1 to 2%; these effects were, respectively, attributed to enhanced carrier hopping between neighboring α-NPD molecules and suppressed penetration of oxygen and water. These results imply that increasing film density is more effective to enhance the electrical performance of organic thin-film devices with α-NPD films than control of molecular orientation.

中文翻译：

通过工程膜密度提高非晶态有机薄膜的电性能和空气稳定性

膜密度和分子取向对N，N'-二（1-萘基）-N，N'-二苯基-（1,1'-联苯）的真空沉积非晶有机膜的载流子传导和空气稳定性的影响研究了-4,4'-二胺（α-NPD）。衬底温度（Ť_子真空沉积过程中）对膜密度和α-NPD的分子取向不同的效果。膜密度是T _sub的凹函数; 在T _sub = 270–300 K时达到最大密度。α-NPD分子在T _sub随机取向= 342 K，并且随着T _sub的减小，它们在基板上的水平方向变得占主导地位。通过将膜密度提高1-2％，可以明显提高空穴电流和空气稳定性。这些影响分别归因于相邻的α-NPD分子之间的载流子跳跃增强以及氧气和水的渗透受到抑制。这些结果暗示增加膜密度比控制分子取向更有效地增强具有α-NPD膜的有机薄膜器件的电性能。

更新日期：2017-11-21

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