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Beating the thermodynamic limit with photo-activation of n-doping in organic semiconductors
Nature Materials ( IF 41.2 ) Pub Date : 2017-11-13 , DOI: 10.1038/nmat5027
Xin Lin , Berthold Wegner , Kyung Min Lee , Michael A. Fusella , Fengyu Zhang , Karttikay Moudgil , Barry P. Rand , Stephen Barlow , Seth R. Marder , Norbert Koch , Antoine Kahn

Beating the thermodynamic limit with photo-activation of n-doping in organic semiconductors

Beating the thermodynamic limit with photo-activation of n-doping in organic semiconductors, Published online: 13 November 2017; doi:10.1038/nmat5027

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The activation of cleavable organometallic dimers upon exposure to ultraviolet radiation allows air-stable n-type doping of organic materials with electron affinity lower than the expected thermodynamic reducing strength of the dimers.

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中文翻译:

通过光激活有机半导体中的n掺杂来突破热力学极限

通过光激活有机半导体中的n掺杂来突破热力学极限

通过光激活有机半导体中的n掺杂打破热力学极限,在线发布:2017年11月13日;doi:10.1038 / nmat5027

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在暴露于紫外线下时,可裂解的有机金属二聚体的活化使有机材料的空气稳定的n型掺杂具有比二聚体预期的热力学降低强度低的电子亲和力。

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更新日期:2017-11-13
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