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Enhanced radiation tolerance of YSZ/Al 2 O 3 multilayered nanofilms with pre-existing nanovoids
Acta Materialia ( IF 9.4 ) Pub Date : 2018-02-01 , DOI: 10.1016/j.actamat.2017.11.018
Hui Wang , Feng Ren , Jun Tang , Wenjing Qin , Lulu Hu , Lan Dong , Bin Yang , Guangxu Cai , Changzhong Jiang

Abstract Utilization of high density small sinks, such as voids, to collect and store helium atoms inside might be a potential new strategy for designing nanostructured materials with high radiation resistance to swelling and embrittlement. To understand the role of pre-existing nanovoids on irradiation, we investigated the evolutions of micro-structure and mechanical properties of the YSZ/Al2O3 multilayered nanofilms irradiated by He+ ions to different fluences. Compared to the Al2O3 monolithic film and the single crystal bulk YSZ, smaller He bubbles were found in the Al2O3 layers of the YSZ/Al2O3 multilayered nanofilms with pre-existing nanovoids after He+ ion irradiation. The growth of He bubbles was restricted inside the Al2O3 layers to avoid the formation of large bubbles. In contrast to the radiation-induced hardening in traditional materials, radiation-induced softening is observed in the YSZ/Al2O3 multilayered nanofilms with pre-existing nanovoids irradiated to high fluences. In addition, the hardness to Young's modulus (H/E) ratio of the YSZ/Al2O3 multilayered nanofilms increases in response to irradiation, which suggests a potential improvement in the wear resistance of the irradiated YSZ/Al2O3 multilayered nanofilms. A defect “loading-unloading” effect at the interfaces was proposed to explain the enhanced radiation tolerance.

中文翻译:

具有预先存在的纳米空隙的 YSZ/Al 2 O 3 多层纳米膜的辐射耐受性增强

摘要 利用高密度小汇(如空隙)来收集和储存氦原子可能是设计具有高抗膨胀和脆化辐射抗性的纳米结构材料的潜在新策略。为了了解预先存在的纳米空隙对辐照的作用,我们研究了被 He+ 离子辐照到不同能量密度的 YSZ/Al2O3 多层纳米膜的微观结构和机械性能的演变。与 Al2O3 单片膜和单晶块体 YSZ 相比,在 He+ 离子照射后,在 YSZ/Al2O3 多层纳米膜的 Al2O3 层中发现了更小的 He 气泡。He 气泡的生长被限制在 Al2O3 层内,以避免形成大气泡。与传统材料中的辐射诱导硬化相反,在 YSZ/Al2O3 多层纳米膜中观察到辐射诱导软化,其中预先存在的纳米空隙受到高通量照射。此外,YSZ/Al2O3 多层纳米膜的硬度与杨氏模量 (H/E) 比随着辐照而增加,这表明辐照后 YSZ/Al2O3 多层纳米膜的耐磨性有潜在改善。提出了界面处的缺陷“加载-卸载”效应来解释增强的辐射耐受性。这表明辐照后的 YSZ/Al2O3 多层纳米膜的耐磨性有潜在改善。提出了界面处的缺陷“加载-卸载”效应来解释增强的辐射耐受性。这表明辐照后的 YSZ/Al2O3 多层纳米膜的耐磨性有潜在改善。提出了界面处的缺陷“加载-卸载”效应来解释增强的辐射耐受性。
更新日期:2018-02-01
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