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Construction of Z-scheme heterostructure with enhanced photocatalytic H2 evolution for g-C3N4 nanosheets via loading porous silicon
Journal of Catalysis ( IF 7.3 ) Pub Date : 2017-11-06 , DOI: 10.1016/j.jcat.2017.10.007
Yanning Shi , Jingjing Chen , Zhiyong Mao , Bradley D. Fahlman , Dajian Wang

In this work, Z-scheme heterostructure were constructed over the visible light response g-C3N4 photocatalysts by loading Porous silicon (PSi) to enhance the photocatalytic H2 evolution performance. The synthesized Z-scheme g-C3N4/PSi composites with a PSi loading content of 2.50 wt% achieves the highest photocatalytic H2 evolution rate at 870.4 µmol h−1 g−1, which is about 2 times as high as the pure g-C3N4 with H2 evolution rate of 427.2 µmol h−1 g−1. Various techniques including XRD, SEM, TEM, FTIR, XPS, UPS, PL and electrochemical method were employed to demonstrate the successful construction of g-C3N4/PSi composites and to investigate the origin of the enhanced potocatalytic activity. The formed heterostructure between g-C3N4 nanosheets and PSi were verified to be the dominant reason for the enhancement of photocatalytic activity, resulting from the separation promotion of photogenerated charge carriers in a direct Z-scheme mechanism. This study presented a promising Z-scheme g-C3N4/PSi photocatalysts with promising H2 evolution performance, which might drive the progress of solar energy conversion technologies.



中文翻译:

通过加载多孔硅构建gC 3 N 4纳米片具有增强的光催化H 2析出的Z型异质结构

在这项工作中,通过加载多孔硅(PSi)以增强光催化H 2的释放性能,在可见光响应gC 3 N 4光催化剂上构建了Z型异质结构。PSi负载量为2.50 wt%的合成Z方案gC 3 N 4 / PSi复合材料在870.4 µmol h -1  g -1时达到最高的光催化H 2释放速率,约为纯gC的2倍。3 N 4,H 2释放速率为427.2 µmol h -1  g -1。包括XRD,SEM,TEM,FTIR,XPS,UPS,PL和电化学方法在内的各种技术被用来证明gC 3 N 4 / PSi复合材料的成功构建,并研究了增强的光催化活性的起源。证实了在gC 3 N 4纳米片和PSi之间形成的异质结构是光催化活性增强的主要原因,这是由直接Z方案机理中光生电荷载流子的分离促进所致。这项研究提出了有前途的Z方案gC 3 N 4 / PSi光催化剂和有前途的H 2 进化性能,这可能会推动太阳能转换技术的进步。

更新日期:2017-11-06
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