Nanolithography of cylinder forming block copolymers via DSA for semiconductor manufacturing,Molecular Systems Design & Engineering

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Nanolithography of cylinder forming block copolymers via DSA for semiconductor manufacturing
Molecular Systems Design & Engineering ( IF 3.2 ) Pub Date : 2017-11-07 00:00:00 , DOI: 10.1039/c7me00066a
Yuri Granik _{1,

2,

3} , Andres Torres _{1,

3,

4}

Affiliation

To realize the full benefit of directed self-assembly (DSA), it is necessary to understand the interplay between the target structures and the process parameters. In this paper, we cover the reasons as to why a compact model and model-based synthesis are required for graphoepitaxial DSA of cylinder forming block copolymers.

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