Abstract The application of graphene as a two-dimensional nano-material has gained wide interest in different research areas, but its use is still novel for scientists. There has been continuous progress in the development of different synthesis methods to readily produce graphene at a lower cost. Chemical vapor deposition (CVD) is a powerful process to produce graphene, and it is accompanied by other methods. The present article provides a detailed review of the synthesis of graphene by a CVD process at temperatures below 1000 °C (LTCVD). In this work, challenges related to the use of plasma-assisted CVD, different carbon precursors, and catalysts are discussed.

中文翻译：

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通过化学气相沉积催化、无催化剂和卷对卷生产石墨烯：低温生长

摘要 石墨烯作为二维纳米材料的应用受到了不同研究领域的广泛关注，但其应用对科学家来说仍然是新事物。在开发不同的合成方法以以较低的成本轻松生产石墨烯方面取得了持续进展。化学气相沉积 (CVD) 是一种强大的石墨烯生产工艺，并伴随有其他方法。本文详细回顾了在低于 1000 °C 的温度下通过 CVD 工艺 (LTCVD) 合成石墨烯。在这项工作中，讨论了与使用等离子体辅助 CVD、不同的碳前体和催化剂相关的挑战。