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Van der Waals epitaxy between the highly lattice mismatched Cu-doped FeSe and Bi2Te3
NPG Asia Materials ( IF 9.7 ) Pub Date : 2017-07-07 , DOI: 10.1038/am.2017.111
Arsham Ghasemi , Demie Kepaptsoglou , Pedro L Galindo , Quentin M Ramasse , Thorsten Hesjedal , Vlado K Lazarov

We present a structural and density functional theory study of FexCu1−xSe within the three-dimensional topological insulator Bi2Te3. The FexCu1−xSe inclusions are single-crystalline and epitaxially oriented with respect to the Bi2Te3 thin film. Aberration-corrected scanning transmission electron microscopy and electron energy loss spectroscopy show an atomically sharp FeICu1−xSe/Bi2Te3 interface. The FexCu1−xSe/Bi2Te3 interface is determined by Se–Te bonds and no misfit dislocations are observed, despite the different lattice symmetries and large lattice mismatch of 19%. First-principle calculations show that the large strain at the FexCu1−xSe/Bi2Te3 interface can be accommodated by van der Waals-like bonding between Se and Te atoms.



中文翻译:

高度晶格失配的Cu掺杂FeSe与Bi 2 Te 3之间的范德华外延

我们提出了三维拓扑绝缘体Bi 2 Te 3中Fe x Cu 1− x Se的结构和密度泛函理论研究。Fe x Cu 1- x Se夹杂物是单晶的,并且相对于Bi 2 Te 3薄膜外延取向。像差校正的扫描透射电子显微镜和电子能量损失谱显示原子上清晰的Fe I Cu 1- x Se / Bi 2 Te 3界面。Fe x Cu 1− x Se / Bi 2Te 3界面由Se–Te键决定,尽管晶格对称性不同且晶格失配率约为19%,但未观察到失配位错。第一性原理计算表明,Fe x Cu 1− x Se / Bi 2 Te 3界面处的大应变可以通过Se和Te原子之间的范德华式键合来适应。

更新日期:2017-07-08
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