The microstructure and physical properties of reflective and black aluminum were compared for layers of different thicknesses deposited by magnetron sputtering on fused silica substrates. Reflective Al layers followed the Volmer–Weber growth mechanism classically observed for polycrystalline metal films. On the contrary, the extra nitrogen gas used to deposit the black aluminum layers modified the growth mechanism and changed the film morphologies. Nitrogen cumulated in the grain boundaries, favoring the pinning effect and stopping crystallite growth. High defect concentration, especially vacancies, led to strong columnar growth. Properties reported for black aluminum tend to be promising for sensors and emissivity applications.

中文翻译：

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黑铝减反射膜的微观结构与物理性能

比较了通过磁控溅射在熔融石英基底上沉积的不同厚度的反射铝和黑铝的微观结构和物理性能。反射铝层遵循多晶金属薄膜经典观察到的 Volmer-Weber 生长机制。相反，用于沉积黑色铝层的额外氮气改变了生长机制并改变了薄膜形态。氮在晶界积聚，有利于钉扎效应并阻止微晶生长。高缺陷浓度，尤其是空位，导致强烈的柱状生长。据报道，黑铝的特性对于传感器和发射率应用来说往往很有前景。