Nanoimprint lithography (NIL) has been utilized to address the manufacturing challenges of high cost and low throughput for optical metasurfaces. To overcome the limitations inherent in conventional imprint resins characterized by a low refractive index (n), high-n nanocomposites have been introduced to directly serve as meta-atoms. However, comprehensive research on these nanocomposites is notably lacking. In this study, we focus on the composition of high-n zirconium dioxide (ZrO₂) nanoparticle (NP) concentration and solvents used to produce ultraviolet (UV) metaholograms and quantify the transfer fidelity by the measured conversion efficiency. The utilization of 80 wt% ZrO₂ NPs in MIBK, MEK, and acetone results in conversion efficiencies of 62.3%, 51.4%, and 61.5%, respectively, at a wavelength of 325 nm. The analysis of the solvent composition and NP concentration can further enhance the manufacturing capabilities of high-n nanocomposites in NIL, enabling potential practical use of optical metasurfaces.

纳米压印光刻（NIL）已被用来解决光学超表面的高成本和低产量的制造挑战。为了克服传统压印树脂固有的低折射率（n）限制，高n纳米复合材料被引入直接用作间位原子。然而，对这些纳米复合材料的全面研究明显缺乏。在这项研究中，我们重点关注高n二氧化锆 (ZrO ₂ ) 纳米粒子 (NP) 浓度的成分和用于产生紫外 (UV) 元全息图的溶剂，并通过测量的转换效率来量化传输保真度。在MIBK、MEK和丙酮中使用80wt%ZrO ₂ NPs在325nm波长下的转化效率分别为62.3%、51.4%和61.5%。对溶剂成分和纳米粒子浓度的分析可以进一步增强 NIL 中高n纳米复合材料的制造能力，从而实现光学超表面的潜在实际应用。