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CO2 gas-triggered wettability control of silylation-modified CNC films by manipulating the surface structure and introducing tertiary amino groups
Polymer Journal ( IF 2.8 ) Pub Date : 2024-02-15 , DOI: 10.1038/s41428-024-00888-8
Hiroyuki Taniyama , Koji Takagi

Here, cellulose nanocrystal (CNC) films were chemically modified in a two-stage process to realize surface wettability control through the introduction of CO2 gas. In addition to controlling the surface structure of the silylation-modified CNC film, functional groups derived from silane compounds were installed, and the corresponding effects on the resulting chemical modification were investigated. In the first stage, methyltriethoxysilane (MTES) and hexyltriethoxysilane (HTES) combined with tetraethoxysilane (TEOS) were subjected to condensation under alkaline conditions. In the second stage, (3-(N,N-dimethylamino)propyl)trimethoxysilane (DMAPS) generated an amino group to control the surface wettability by adsorption CO2 gas. Then, the silylation-modified CNC film was fabricated on a glass substrate by spin coating. Fourier transform infrared (FT-IR), nuclear magnetic resonance (29Si-NMR), and X-ray photoelectron spectroscopy (XPS) inspection indicated that the silane compounds were bonded to the CNC film surface and that tertiary amino groups were successfully introduced. The surface structure of the silylation-modified CNC film was analyzed by atomic force microscopy (AFM), and the surface roughness calculating indicated a root-mean-square roughness (RMS) of 4.2 nm. The water contact angles before and after the CO2 gas treatment were evaluated as 73o and 22o, respectively.



中文翻译:

通过操纵表面结构和引入叔氨基来控制硅烷化改性 CNC 薄膜的 CO2 气体触发润湿性

在这里,纤维素纳米晶体(CNC)薄膜在两阶段过程中进行化学改性,通过引入CO 2气体实现表面润湿性控制。除了控制硅烷化改性CNC薄膜的表面结构外,还安装了源自硅烷化合物的官能团,并研究了对所得化学改性的相应影响。在第一阶段,甲基三乙氧基硅烷(MTES)和己基三乙氧基硅烷(HTES)与四乙氧基硅烷(TEOS)在碱性条件下进行缩合。第二阶段,(3-( N , N-二甲基氨基)丙基)三甲氧基硅烷(DMAPS)通过吸附CO 2气体产生氨基来控制表面润湿性。然后,通过旋涂在玻璃基板上制备硅烷化改性的CNC薄膜。傅里叶变换红外(FT-IR)、核磁共振( 29 Si-NMR)和X射线光电子能谱(XPS)检查表明硅烷化合物键合到CNC薄膜表面并成功引入叔氨基。通过原子力显微镜(AFM)分析硅烷化改性的CNC薄膜的表面结构,表面粗糙度计算表明均方根粗糙度(RMS)为4.2 nm。 CO 2气体处理前后的水接触角分别评价为73 °和22 °

更新日期:2024-02-15
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