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Depth analysis of local conformation in poly(methyl methacrylate) adsorbed onto SiOx studied by soft X-ray absorption spectroscopy combined with an Ar gas cluster ion beam
Polymer Journal ( IF 2.8 ) Pub Date : 2023-12-25 , DOI: 10.1038/s41428-023-00864-8
Hiroyuki Yamane , Masaki Oura , Daisuke Kawaguchi , Kiyofumi Nitta , Oki Sekizawa , Tetsuya Ishikawa , Satoru Yamamoto , Keiji Tanaka , Takaki Hatsui

Using X-ray absorption spectroscopy (XAS) with linearly polarized soft X-rays, we investigated the local conformation of poly(methyl methacrylate) (PMMA) adsorbed to a SiOx/Si(111) surface. The preedge intensity of the O K-edge XAS for PMMA, originating from the O 1s → π* transition at a C=O group in the side chain, was stronger for vertically polarized incident X-rays than for horizontally polarized ones. Conversely, the XAS intensity originating from the O 1s → σ* transition showed the opposite trend. These findings suggest that the C=O group in the side chain of PMMA exhibited preferential orientation rather than an amorphous arrangement. To gain further insights, we conducted a depth profile analysis of the local conformation of PMMA using XAS combined with an argon gas cluster ion beam (GCIB). GCIB-XAS analysis revealed that the orientation of the C=O group in the side chain of PMMA differs between the region from the SiOx interface to a distance on the order of 1 nanometer and the bulk PMMA region.



中文翻译:

软 X 射线吸收光谱结合 Ar 气体团簇离子束对 SiOx 上吸附的聚甲基丙烯酸甲酯的局部构象进行深度分析

使用线性偏振软 X 射线的 X 射线吸收光谱 (XAS),我们研究了吸附在 SiO x /Si(111)表面上的聚甲基丙烯酸甲酯 (PMMA) 的局部构象。PMMA 的 O K 边缘 XAS 的预边缘强度源自侧链 C=O 基团处的 O 1s → π *跃迁,垂直偏振入射 X 射线的预边缘强度比水平偏振入射 X 射线更强。相反,源自O 1s → σ *跃迁的XAS强度显示出相反的趋势。这些发现表明PMMA侧链中的C=O基团表现出择优取向而不是无定形排列。为了获得进一步的见解,我们使用 XAS 结合氩气团簇离子束 (GCIB) 对 PMMA 的局部构象进行了深度剖面分析。GCIB-XAS分析表明,PMMA侧链中C=O基团的取向在距SiO x界面至1纳米数量级的区域和本体PMMA区域之间有所不同。

更新日期:2023-12-26
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