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Atomic layer deposition (ALD) of palladium: from processes to applications
Critical Reviews in Solid State and Materials Sciences ( IF 10.8 ) Pub Date : 2023-11-15 , DOI: 10.1080/10408436.2023.2273463
Clément Lausecker 1 , David Muñoz-Rojas 1 , Matthieu Weber 1
Affiliation  

Atomic layer deposition (ALD) has been successfully used for the deposition of palladium (Pd) thin films and nanostructures, with a wide range of applications in fields such as microelectronics, en...

中文翻译:

钯原子层沉积 (ALD):从工艺到应用

原子层沉积(ALD)已成功用于钯(Pd)薄膜和纳米结构的沉积,在微电子、能源等领域具有广泛的应用。
更新日期:2023-11-15
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