Abstract

Following the initial report on ferroelectricity in hafnia (HfO₂) more than a decade ago, the researchers’ interest in this intriguing material system has constantly increased due to the promise it holds for future applications. Currently, there is an unbalanced situation, where an overwhelming majority of studies focus on either nanoscale characterization or on tuning the growth conditions in view of improving the properties of HfO₂, but only few applications of this material system are being investigated. The goal of this review is to provide an overview of all emerging nanoscale ferroelectrics, to review their integration in most promising devices and to provide a critical analysis addressing the detrimental physical effects of nanoscale ferroelectrics on the performance of devices while outlining the perspectives to alleviate these adverse effects.

摘要

继十多年前首次报道二氧化铪 (HfO _{2 ) 的铁电性之后，研究人员对这种有趣的材料系统的兴趣不断增加，因为它在未来的应用中具有前景。}目前，存在一种不平衡的情况，绝大多数研究集中在纳米尺度表征或调整生长条件以改善HfO _2的性能，但仅研究了这种材料系统的少数应用。本次综述的目的是概述所有新兴纳米级铁电体，回顾它们在最有前途的设备中的集成，并提供批判性分析，解决纳米级铁电体对设备性能的有害物理影响，同时概述缓解这些影响的观点不利影响。