Soft nanoimprint lithography has been limited to ultraviolet (UV) curable resists. Here, we introduce a novel approach for soft thermal nanoimprinting. Thisunprecedented combination of the terms “soft” and “thermal” for nanoimprinting became possible thanks to an innovative nanocomposite mold consisting of aflexible polydimethylsiloxane (PDMS) substrate with chemically attached rigidrelief features. We used soft thermal nanoimprinting to produce high-resolution nanopatterns with a sub-100 nm feature size. Furthermore, we demonstrate the applicability of our nanoimprint approach for the nanofabrication of thermallyimprinted nanopatterns on non-planar surfaces such as lenses. Our new nanofabrication strategy paves the way to numerous applications that require the direct fabrication of functional nanostructures on unconventional substrates.

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使用纳米复合材料模具的软热纳米压印光刻

软纳米压印光刻技术仅限于可紫外（UV）固化的抗蚀剂。在这里，我们介绍了一种用于软热纳米压印的新颖方法。得益于由柔性聚二甲基硅氧烷（PDMS）基材和化学附着的刚性浮雕特征组成的创新纳米复合模具，这种用于纳米压印的术语“软”和“热”的前所未有的组合成为可能。我们使用软热纳米压印技术来生产特征尺寸小于100 nm的高分辨率纳米图案。此外，我们证明了我们的纳米压印方法适用于在非平面表面（如镜片）上进行热压印纳米图案的纳米加工。我们的新纳米加工策略为需要在非常规基材上直接制备功能纳米结构的众多应用铺平了道路。