Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space,Nano Letters

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Printing Beyond sRGB Color Gamut by Mimicking Silicon Nanostructures in Free-Space
Nano Letters ( IF 9.6 ) Pub Date : 2017-11-08 00:00:00 , DOI: 10.1021/acs.nanolett.7b03613
Zhaogang Dong ₁ , Jinfa Ho ₁ , Ye Feng Yu ₂ , Yuan Hsing Fu ₂ , Ramón Paniagua-Dominguez ₂ , Sihao Wang ₁ , Arseniy I. Kuznetsov ₂ , Joel K. W. Yang _{1,

3}

Affiliation

Localized optical resonances in metallic nanostructures have been increasingly used in color printing, demonstrating unprecedented resolution but limited in color gamut. Here, we introduce a new nanostructure design, which broadens the gamut while retaining print resolution. Instead of metals, silicon nanostructures that exhibit localized magnetic and electric dipole resonances were fabricated on a silicon substrate coated with a Si₃N₄ index matching layer. Index matching allows a suppression of substrate effects, thus enabling Kerker’s conditions to be met, that is, sharpened transitions in the reflectance spectra leading to saturated colors. This nanostructure design achieves a color gamut superior to sRGB, and is compatible with CMOS processes. The presented design could enable compact high-resolution color displays and filters, and the use of a Si₃N₄ antireflection coating can be readily extended to designs with nanostructures fabricated using other high-index materials.

中文翻译：

通过模仿自由空间中的硅纳米结构，在sRGB色域之外进行打印

金属纳米结构中的局部光学共振已越来越多地用于彩色印刷中，这表明了前所未有的分辨率，但色域有限。在这里，我们介绍了一种新的纳米结构设计，该设计在保持打印分辨率的同时扩大了色域。代替金属，在涂覆有Si ₃ N ₄的硅衬底上制造了具有局部磁和电偶极子共振的硅纳米结构。索引匹配层。折射率匹配可以抑制基片效应，因此可以满足Kerker的条件，即，反射光谱中的跃迁变陡，导致色彩饱和。这种纳米结构设计实现了优于sRGB的色域，并且与CMOS工艺兼容。提出的设计可以实现紧凑的高分辨率彩色显示器和滤光片，并且Si ₃ N ₄减反射涂层的使用可以很容易地扩展到具有使用其他高折射率材料制造的纳米结构的设计。

更新日期：2017-11-08

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