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Chemical and Electronic Repair Mechanism of Defects in MoS2 Monolayers
ACS Nano ( IF 15.8 ) Pub Date : 2017-09-22 00:00:00 , DOI: 10.1021/acsnano.7b04162
Anja Förster 1, 2, 3 , Sibylle Gemming 2, 4, 5 , Gotthard Seifert 2, 3, 6 , David Tománek 1
Affiliation  

Using ab initio density functional theory calculations, we characterize changes in the electronic structure of MoS2 monolayers introduced by missing or additional adsorbed sulfur atoms. We furthermore identify the chemical and electronic function of substances that have been reported to reduce the adverse effect of sulfur vacancies in quenching photoluminescence and reducing electronic conductance. We find that thiol-group-containing molecules adsorbed at vacancy sites may reinsert missing sulfur atoms. In the presence of additional adsorbed sulfur atoms, thiols may form disulfides on the MoS2 surface to mitigate the adverse effect of defects.

中文翻译:

MoS 2单层缺陷的化学和电子修复机理

使用从头算密度泛函理论计算,我们表征了MoS 2单层电子结构的变化,该结构是由于缺少或额外吸附的硫原子而引入的。我们进一步确定了已报道的物质的化学和电子功能,这些物质可减少硫空位在淬灭光致发光中的不利影响并降低电子电导率。我们发现,空位处吸附的含巯基的分子可能会重新插入缺失的硫原子。在存在额外的吸附硫原子的情况下,硫醇可在MoS 2表面形成二硫化物,以减轻缺陷的不利影响。
更新日期:2017-09-22
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